Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 231, Issue 1-4, 2005, Pages 170-175

  Van Kan, J A ^a   Shao, P G ^a   Molter, P ^b   Saumer, M ^b   Bettiol, A A ^a   Osipowicz, T ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF APPLIED SCIENCES KAISERSLAUTERN   (Germany)

Author keywords

Direct write; Nuclear microscopy; Proton beam writing; Resolution standard

Indexed keywords

NANOSTRUCTURED MATERIALS; PROTON BEAMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY ANALYSIS;

DIRECT WRITE; NUCLEAR MICROSCOPY; PROTON BEAM WRITING; RESOLUTION STANDARD;

ION BEAMS;

EID: 33644538276     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.01.052     Document Type: Conference Paper

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