Sticking probability of Ti atoms in magnetron sputtering deposition evaluated from the spatial distribution of Ti atom density

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 308-311

  Nafarizal, N ^a   Sasaki, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIFFUSION; FLUORESCENCE SPECTROSCOPY; MAGNETRON SPUTTERING; TITANIUM;

MAGNETRON SPUTTERING DEPOSITION; STICKING PROBABILITY;

SUBSTRATES;

EID: 34248549325     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2539256     Document Type: Article

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