-
1
-
-
49749125935
-
-
Version 2006.06
-
Liberty User Guide, Vol. 1, Version 2006.06.
-
Liberty User Guide
, vol.1
-
-
-
2
-
-
49749088881
-
-
International Technology Roadmap for Semiconductors, http://public.itrs.net/.
-
-
-
-
3
-
-
49749098863
-
-
OPENCORES.ORG, http://www.opencores.org/.
-
OPENCORES.ORG, http://www.opencores.org/.
-
-
-
-
4
-
-
0036030215
-
Impact of Subwave-length CD Tolerance on Device Performance
-
A. P. Balasinski, L. Karklin and V. Axelrad, "Impact of Subwave-length CD Tolerance on Device Performance", Proc. SPIE, 361 (2002), pp. 361-368.
-
(2002)
Proc. SPIE
, vol.361
, pp. 361-368
-
-
Balasinski, A.P.1
Karklin, L.2
Axelrad, V.3
-
6
-
-
33846564061
-
Standard Cell Characterization Considering Lithography Induced Variations
-
K. Cao, S. Dobre and J. Hu, "Standard Cell Characterization Considering Lithography Induced Variations", Proc. DAC, 2006, pp. 801-804.
-
(2006)
Proc. DAC
, pp. 801-804
-
-
Cao, K.1
Dobre, S.2
Hu, J.3
-
7
-
-
49749085842
-
Litho-Driven Layouts for Reducing Performance Variability
-
M. Garg, A. Kumar, J. van Wingerden and L. Le Cam, "Litho-Driven Layouts for Reducing Performance Variability", Proc. IS-CAS, 2005, pp. 3551-3554.
-
(2005)
Proc. IS-CAS
, pp. 3551-3554
-
-
Garg, M.1
Kumar, A.2
van Wingerden, J.3
Le Cam, L.4
-
8
-
-
4444353564
-
Toward a Systematic-Variation Aware Timing Methodology
-
P. Gupta and F.-L. Heng, "Toward a Systematic-Variation Aware Timing Methodology", Proc. DAC, 2004, pp. 321-326.
-
(2004)
Proc. DAC
, pp. 321-326
-
-
Gupta, P.1
Heng, F.-L.2
-
9
-
-
33745798166
-
-
P. Gupta, A. B. Kahng, S. Nakagawa, S. Shah and P. Sharma, Lithography Simulation-Based Full-Chip Design Analyses, Proc. SPIE, 6156 (2006), pp. 61560T1-61560T8.
-
P. Gupta, A. B. Kahng, S. Nakagawa, S. Shah and P. Sharma, "Lithography Simulation-Based Full-Chip Design Analyses", Proc. SPIE, vol. 6156 (2006), pp. 61560T1-61560T8.
-
-
-
-
10
-
-
33745788792
-
-
P. Gupta, A. B. Kahng, Y. Kim, S. Shah and D. Sylvester, Modeling of Non-Uniform Device Geometries for Post-Lithography Circuit Analysis, Proc. SPIE, 6156 (2006), pp. 61560U1-61560U10.
-
P. Gupta, A. B. Kahng, Y. Kim, S. Shah and D. Sylvester, "Modeling of Non-Uniform Device Geometries for Post-Lithography Circuit Analysis", Proc. SPIE, Vol. 6156 (2006), pp. 61560U1-61560U10.
-
-
-
-
11
-
-
0030400099
-
Interconnect Yield Model for Manufacturability Prediction in Synthesis of Standard Cell Based Designs
-
H. T. Heineken and W. Maly, "Interconnect Yield Model for Manufacturability Prediction in Synthesis of Standard Cell Based Designs", Proc. ICCAD, 1996, pp. 368-373.
-
(1996)
Proc. ICCAD
, pp. 368-373
-
-
Heineken, H.T.1
Maly, W.2
-
12
-
-
29144514966
-
Measurement of Inherent Noise in EDA Tools
-
A. B. Kahng and S. Mantik, "Measurement of Inherent Noise in EDA Tools", Proc. ISQED, 2002, pp. 206-211.
-
(2002)
Proc. ISQED
, pp. 206-211
-
-
Kahng, A.B.1
Mantik, S.2
-
13
-
-
0006916802
-
Modeling and Forecasting of Manufacturing Variations
-
S. Nassif, "Modeling and Forecasting of Manufacturing Variations", Proc. IWSM, 2000, pp. 2-10.
-
(2000)
Proc. IWSM
, pp. 2-10
-
-
Nassif, S.1
-
14
-
-
0242609813
-
Physical and Timing Verification of Subwavelength-Scale Designs: I. Lithography Impact on MOSFETs
-
R. C. Pack, V. Axelrad, A. Shibkov, V. V. Boksha, J. A. Huckabay, R. Salik, W. Staud, R. Wang and W. D. Grobman, "Physical and Timing Verification of Subwavelength-Scale Designs: I. Lithography Impact on MOSFETs", Proc. SPIE, 51 (2003), pp. 51-62.
-
(2003)
Proc. SPIE
, vol.51
, pp. 51-62
-
-
Pack, R.C.1
Axelrad, V.2
Shibkov, A.3
Boksha, V.V.4
Huckabay, J.A.5
Salik, R.6
Staud, W.7
Wang, R.8
Grobman, W.D.9
-
15
-
-
49749129977
-
Why Are Timing Estimates So Uncertain? What Could We Do About This?
-
Available at
-
L. Scheffer, "Why Are Timing Estimates So Uncertain? What Could We Do About This?", Workshop Notes, TAU-2002. Available at http://www.lscheffer.com/Uncertain.pdf.
-
Workshop Notes, TAU-2002
-
-
Scheffer, L.1
-
16
-
-
33750928791
-
An Overview of On-Chip Interconnect Variation
-
L. Scheffer, "An Overview of On-Chip Interconnect Variation", Proc. SLIP, 2006, pp. 27-28.
-
(2006)
Proc. SLIP
, pp. 27-28
-
-
Scheffer, L.1
-
17
-
-
33845866334
-
Integrated Simulation Flow for Self-Consistent Manufacturability and Circuit Performance Evaluation
-
A. Shibkov and V. Axelrad, "Integrated Simulation Flow for Self-Consistent Manufacturability and Circuit Performance Evaluation", Proc. SISPAD, 2005, pp. 127-130.
-
(2005)
Proc. SISPAD
, pp. 127-130
-
-
Shibkov, A.1
Axelrad, V.2
-
18
-
-
35148855048
-
Context-Specific Leakage and Delay Analysis of a 65nm Standard Cell Library for Lithography-Induced Variability
-
D. Tsien, C.K. Wang, Y. Ran, P. Hurat and N. Verghese, "Context-Specific Leakage and Delay Analysis of a 65nm Standard Cell Library for Lithography-Induced Variability", Proc. SPIE, Vol. 6521, 2007, pp. 65210F
-
(2007)
Proc. SPIE
, vol.6521
-
-
Tsien, D.1
Wang, C.K.2
Ran, Y.3
Hurat, P.4
Verghese, N.5
-
20
-
-
27944483718
-
Advanced Timing Analysis Based on Post-OPC Extraction of Critical Dimensions
-
J. Yang, L. Capodieci and D. Sylvester, "Advanced Timing Analysis Based on Post-OPC Extraction of Critical Dimensions", Proc. DAC, 2005, pp. 359-364.
-
(2005)
Proc. DAC
, pp. 359-364
-
-
Yang, J.1
Capodieci, L.2
Sylvester, D.3
-
21
-
-
34547322044
-
Comparative Analysis of Conventional and Statistical Design Techniques
-
S. M. Burns, M. Ketkar, N. Menezes, K. A. Bowman, J. W. Tschanz and V. De, "Comparative Analysis of Conventional and Statistical Design Techniques", Proc. DAC, 2007, pp. 238-243.
-
(2007)
Proc. DAC
, pp. 238-243
-
-
Burns, S.M.1
Ketkar, M.2
Menezes, N.3
Bowman, K.A.4
Tschanz, J.W.5
De, V.6
-
22
-
-
27944475630
-
On the Need for Statistical Timing Analysis
-
F. N. Najm, "On the Need for Statistical Timing Analysis", Proc. DAC, 2005, pp. 764-765.
-
(2005)
Proc. DAC
, pp. 764-765
-
-
Najm, F.N.1
-
23
-
-
0032599268
-
Modeling the Impact of Back-End Process Variation on Circuit Performance
-
D. Sylvester, O. S. Nakagawa and C. Hu, "Modeling the Impact of Back-End Process Variation on Circuit Performance", Proc. VL-SITSA, 1999, pp. 58-61.
-
(1999)
Proc. VL-SITSA
, pp. 58-61
-
-
Sylvester, D.1
Nakagawa, O.S.2
Hu, C.3
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