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Volumn , Issue , 2004, Pages 321-326

Toward a systematic-variation aware timing methodology

Author keywords

ACLV; Layout; Lithography; Manufacturability; OPC

Indexed keywords

ALGORITHMS; APPLICATION SPECIFIC INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; COMPUTATIONAL GEOMETRY; CONSTRAINT THEORY; IMAGE SENSORS; INFORMATION ANALYSIS; LITHOGRAPHY; PARAMETER ESTIMATION; SILICON WAFERS;

EID: 4444353564     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/996566.996660     Document Type: Conference Paper
Times cited : (70)

References (16)
  • 3
    • 0036049629 scopus 로고    scopus 로고
    • A general probabilistic framework for worst case timing analysis
    • M. Orshansky and K. Keutzer, "A General Probabilistic Framework for Worst Case Timing Analysis", Proc. Design Automation Conference, 2002, pp.556-561.
    • (2002) Proc. Design Automation Conference , pp. 556-561
    • Orshansky, M.1    Keutzer, K.2
  • 8
    • 4444305783 scopus 로고    scopus 로고
    • IBM Corp., Personal Communication, July
    • William Chu, IBM Corp., Personal Communication, July 2003.
    • (2003)
    • Chu, W.1
  • 10
    • 0030709847 scopus 로고    scopus 로고
    • Development and application of a new tool for lithographic mask evaluation, the stepper equivalent aerial image measurement system, AIMS
    • R.A. Budd, D.B. Dove, J.L. Staples, R.M. Martino, R.A. Ferguson, and J.T. Weed, "Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS", IBM Journal of R&D, 41(12), pp. 119-129.
    • IBM Journal of R&D , vol.41 , Issue.12 , pp. 119-129
    • Budd, R.A.1    Dove, D.B.2    Staples, J.L.3    Martino, R.M.4    Ferguson, R.A.5    Weed, J.T.6
  • 11
    • 4444243421 scopus 로고    scopus 로고
    • ASML MaskTools Inc., http://www.masktools.com/content/scat_bars.pdf
  • 12
    • 0032674029 scopus 로고    scopus 로고
    • Subwavelength lithography and its potential impact on design and EDA
    • A.B. Kahng and Y.C. Pati, "Subwavelength Lithography and its Potential Impact on Design and EDA", Proc. ACM/IEEE Design Automation Conf. 1999, pp. 799-804.
    • (1999) Proc. ACM/IEEE Design Automation Conf. , pp. 799-804
    • Kahng, A.B.1    Pati, Y.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.