Fabrication uncertainties and yield optimization in MEMS tunable capacitors

Sensors and Actuators, A: Physical

Volumn 147, Issue 2, 2008, Pages 613-622

  Shavezipur, M ^a   Ponnambalam, K ^a   Khajepour, A ^a   Hashemi, S M ^b  

^a UNIVERSITY OF WATERLOO   (Canada)

^b RYERSON UNIVERSITY   (Canada)

Author keywords

Design optimization; Fabrication uncertainties; MEMS capacitor; Non parallel plate capacitor; Tolerance design; Yield optimization

Indexed keywords

CAPACITANCE; CAPACITORS; CHLORINE COMPOUNDS; CLUSTER ANALYSIS; COMPOSITE MICROMECHANICS; COMPUTATIONAL COMPLEXITY; DIELECTRIC DEVICES; DISTRIBUTION FUNCTIONS; ELECTRIC CURRENTS; ELECTRIC EQUIPMENT; ENERGY STORAGE; INTEGRATION; MEMS; METHOD OF MOMENTS; MICROELECTROMECHANICAL DEVICES; NUMERICAL ANALYSIS; OPTICAL DESIGN; PAPER CAPACITORS; PHOTORESISTS; RANDOM VARIABLES; UNCERTAINTY ANALYSIS;

DESIGN OPTIMIZATION; DESIGN PARAMETERS; DEVICE PERFORMANCES; FABRICATION ACCURACY; FABRICATION UNCERTAINTIES; FEASIBLE REGION; FIRST ORDER SECOND MOMENTS; INITIAL GAP; JOINT CUMULATIVE DISTRIBUTION FUNCTION; LOW-YIELD; MEMS CAPACITOR; MEMS CAPACITORS; MEMS FABRICATION; MONTE-CARLO; NON-PARALLEL PLATE CAPACITOR; NUMERICAL INTEGRATIONS; OPTIMAL DESIGNS; OPTIMUM DESIGNS; PERFORMANCE OF DEVICES; RELIABILITY METHODS; TOLERANCE DESIGN; TUNABLE CAPACITORS; YIELD OPTIMIZATION;

OPTIMIZATION;

EID: 49649095344     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2008.03.025     Document Type: Article

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