The modelling and fabrication of widely tunable capacitors

Journal of Micromechanics and Microengineering

Volumn 13, Issue 4, 2003, Pages

  Gallant, A J ^a   Wood, D ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; COMPRESSIVE STRESS; COMPUTER SIMULATION; ELECTROSTATICS; RESIDUAL STRESSES; TENSILE STRESS; TUNING; VOLTAGE CONTROL;

BIASING VOLTAGES;

MICROELECTROMECHANICAL DEVICES;

EID: 0038441774     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/13/4/326     Document Type: Conference Paper

References (10)

1. Yao J J 2000 RF MEMS from a device perspective J. Micromech. Microeng. 10 R9-R38
2. Dec A and Suyama K 2000 A 1.9-GHz CMOS VCO with micromachined electromechanically tunable capacitors IEEE J. Solid-State Circuits 35 1231-7
3. Zou J, Liu C and Schutt-Ainé J E 2001 Development of a wide-tuning-range two-parallel-plate tunable capacitor for integrated wireless communication systems Int. J. RF Microw. CAE 11 322-9
4. Nieminen H, Ermolov V, Nybergh K, Silanto S and Ryhänen T 2002 Microelectromechanical capacitors for RF applications J. Micromech. Microeng. 12 177-86
5. Rebeiz G M and Muldavin J B 2001 RF MEMS switches and switch circuits IEEE Microw. Mag. 2 59-71
6. Coventorware 2001.1 User's Manual Coventor Inc. Cary NC 27513, USA (webpage: http://www.coventor.com)
7. Gallant A J and Wood D 2002 Nickel electroplated widely tunable micromachined capacitor Electron. Lett. 38 1392-3
8. Ono T, Sim D Y and Esashi M 2000 Micro-discharge and electrical breakdown in a micro-gap J. Micromech. Microeng. 10 445-51
9. Hung E S and Senturia S D 1999 Extending the travel range of analog-tuned electrostatic actuators IEEE J. MEMS 8 497-505
10. Larsen K P, Ravnkilde J T, Ginnerup M and Hansen O 2002 Devices for fatigue testing of electroplated nickel (MEMS) Proc. IEEE MEMS Workshop (Las Vegas) pp 443-6