Effect of annealing on molybdenum doped indium oxide thin films RF sputtered at room temperature

Vacuum

Volumn 82, Issue 12, 2008, Pages 1489-1494

  Elangovan, E ^a   Marques, A ^a   Pimentel, A ^a   Martins, R ^a   Fortunato, E ^a  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

Author keywords

Indium oxide; Molybdenum doping; Thin films and RF sputtering

Indexed keywords

ANNEALING; INDIUM; MAGNETRON SPUTTERING; MOLYBDENUM; NONMETALS; OXYGEN; SPUTTER DEPOSITION; THICK FILMS; THIN FILMS;

INDIUM OXIDE; MOLYBDENUM DOPING; MOLYBDENUM-DOPED INDIUM OXIDE THIN FILMS; OXYGEN VOLUME; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURES; THIN FILMS AND RF SPUTTERING;

OXIDE FILMS;

EID: 49349088879     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.005     Document Type: Article

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