Development of radio-frequency magnetron sputtered indium molybdenum oxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1092-1097

  Yoshida, Y ^a   Gessert, T A ^b   Perkins, C L ^b   Coutts, T J ^b  

^a Department of Geology and Geological Engineering   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BAND STRUCTURE; CARRIER CONCENTRATION; CARRIER MOBILITY; ELECTRON SCATTERING; MAGNETRON SPUTTERING; OXYGEN; SPUTTER DEPOSITION; SUBSTRATES; TEMPERATURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLYBDENUM-DOPED INDIUM OXIDE; RADIO-FREQUENCY MAGNETRON SPUTTERING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0041529608     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1586281     Document Type: Article

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