Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Journal of Materials Research

Volumn 20, Issue 6, 2005, Pages 1404-1408

  Li, Xifeng ^a   Miao, Weina ^a   Zhang, Qun ^a   Huang, Li ^a   Zhang, Zhuangjian ^a   Hua, Zhongyi ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; GLASS; MAGNETRON SPUTTERING; MOLYBDENUM; OXYGEN; PARTIAL PRESSURE; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIRECT-CURRENT MAGNETRON SPUTTERING; MOLYBDENUM-DOPED INDIUM OXIDE THIN FILMS; OPTOELECTRICAL PROPERTIES; OXYGEN PARTIAL PRESSURE;

INDIUM COMPOUNDS;

EID: 22844439616     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0184     Document Type: Article

References (21)

1. R.G. Gordon: Criteria for choosing transparent conductors. MRS Bull. 25(8), 52 (2000).
2. D.S. Ginley and C. Bright: Transparent conducting oxides. MRS Bull. 25(8), 15 (2000).
3. J.R. Bellingham, W.A. Phillips, and C.J. Adkins: Intrinsic performance limits in transparent conducting oxides. J. Mater. Sci. Let. 11, 263 (1992).
4. 3 films: Basic optical properties and applications to energy-efficient windows. J. Appl. Phys. 60, R123 (1986).
5. T.J. Coutts, D.L. Young, and X. Li: Characterization of transparent conducting oxides. MRS Bull. 25(8), 58 (2000).
6. 3: Mo. Thin Solid Films 394, 218 (2001).
7. Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, Z.J. Zhang, and Z.Y. Hua: Molybdenum-doped indium oxide transparent conductive thin films. J. Vac. Sci. Technol. A 20, 288 (2002).
8. Y. Meng, Z.J. Zhang, and Z.Y. Hua: Study on carrier mobility of transparent conductive IMO films. Vac. Sci. Technol. 22, 265 (2002), (in Chinese).
9. Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, and Z.J. Zhang: Transparent conductive oxide doped thin films with high valence difference between dopant and ion substituted. Optoelectron. Technol. 21, 17 (2001), (in Chinese).
10. C.G. Granqvist and A. Hultåke: Transparent and conducting ITO films: New developments and applications. Thin Solid Films 411, 1 (2002).
11. Y. Yoshidaa, T.A. Gessert, C.L. Perkins, and T.J. Coutts: Development of radio-frequency magnetron sputtered indium molybdenum oxide. J. Vac. Sci. Technol. A 21, 1092 (2003).
12. Y. Yoshida, D.M. Wood, T.A. Gessert, and T.J. Coutts: High-mobility, sputtered films of indium oxide doped with molybdenum. Appl. Phys. Lett. 84, 2097 (2004).
13. D. Ginley, B. Roy, A. Ode, C. Warmsingh, Y. Yoshida, P. Parilla, C. Teplin, T. Kaydanova, A. Miedaner, C. Curtis, A. Martinson, T. Coutts, D. Teadey, H. Hosono, and J. Perkins: Non-vacuum and PLD growth of next generation TCO materials. Thin Solid Films 445, 193 (2003).
14. 3 thin films by pulsed laser deposition. J. Appl. Phys. 95, 3831 (2004).
15. S-Y. Sun, J-L. Huang, and D-F. Lii: Effects of oxygen contents on the electrical and optical properties of indium molybdenum oxide films fabricated by high density plasma evaporation. J. Vac. Sci. Technol. A 22, 1235 (2004).
16. J.F. Wager: Transparent electronics. Science 300, 1245 (2003).
17. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono: Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor. Science 300, 1269 (2003).
18. R.B.H. Tahar, T. Ban, Y. Ohya, and A. Salehi: Annealing effects on opto-electronic properties of sputtered and thermally evaporated indium-tin-oxide films. Thin Solid Films 312, 268 (1998).
19. M. Chen, Z.L. Pei, X. Wang, Y.H. Yu, X.H. Liu, C. Sun, and L.S. Wen: Intrinsic limit of electrical properties of transparent conductive oxide films. J. Phys. D: Appl. Phys. 33, 2538 (2000).
20. T.J. Vink, W. Walravae, J.F.C. Daams, P.C. Baarslag, and J.E.A.M. Meerakker: On the homogeneity of sputter-deposited ITO films. Part I: Stress and microstructure. Thin Solid Films 266, 145 (1995).
21. A.K. Kulkarni, K.H. Schulz, T.S. Lim, and M. Khan: Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from x-ray diffraction techniques. Thin Solid Films 345, 273 (1999).