Temperature dependence of microstructure and strain evolution in strained ZnO films on Al2O3(0001)

Nanotechnology

Volumn 19, Issue 35, 2008, Pages

  Kim, In Woo ^a   Lee, Kyu Mann ^b  

^a SAMSUNG Electronics   (South Korea)

^b Korea University of Technology and Education   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSTRUCTURE; SPUTTERING; ZINC OXIDE;

GROWTH MODES; MICROSTRUCTURE EVOLUTIONS; STRAIN EVOLUTION; TEMPERATURE DEPENDENCES; ZNO FILMS;

TEMPERATURE DISTRIBUTION;

ALUMINUM OXIDE; ZINC OXIDE;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; HIGH TEMPERATURE; MATERIALS TESTING; PHYSICAL STRESS; PRIORITY JOURNAL; RADIATION SCATTERING; TEMPERATURE DEPENDENCE; VAPOR;

EID: 48249085763     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/35/355709     Document Type: Article

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