ZnO metal-organic vapor phase epitaxy: Present state and prospective applications

Journal of Alloys and Compounds

Volumn 371, Issue 1-2, 2004, Pages 77-81

  Waag, A ^a   Gruber, Th ^a   Thonke, K ^a   Sauer, R ^a   Kling, R ^a   Kirchner, C ^a   Ress, H ^b  

^a UNIVERSITY OF ULM   (Germany)

^b BRUKER AXS GMBH   (Germany)

Author keywords

Crystal growth; Luminescence; Semiconductors; X ray diffraction

Indexed keywords

BINDING ENERGY; CRYSTAL GROWTH; ENERGY GAP; EXCITONS; FERROMAGNETIC MATERIALS; FILM GROWTH; GIANT MAGNETORESISTANCE; METALLORGANIC VAPOR PHASE EPITAXY; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; POINT DEFECTS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BAND GAPS; OPTICAL QUALITY; SEMIMAGNETIC SEMICONDUCTORS;

ZINC OXIDE;

EID: 2342475765     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2003.06.007     Document Type: Conference Paper

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