Enhanced accuracy of force application for AFM nanomanipulation using nonlinear calibration of optical levers

IEEE Sensors Journal

Volumn 8, Issue 8, 2008, Pages 1478-1485

  Xie, Hui ^a,b   Vitard, Julien ^b   Haliyo, Dogan Sinan ^b   Régnier, Stéphane ^b  

^a IEEE

^b UNIVERSITÉ PIERRE ET MARIE CURIE   (France)

Author keywords

Atomic force microscope (AFM); Force calibration; Nanomanipulation; Nonlinearity compensation; Optical lever

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; CURVE FITTING; DETECTORS; EXTREME ULTRAVIOLET LITHOGRAPHY; FLOW INTERACTIONS; MANIPULATORS; MEASUREMENT THEORY; MICROMANIPULATORS; NANOTECHNOLOGY; PHOTODIODES; PHOTORESISTS; PULSED LASER DEPOSITION;

ATOMIC FORCE MICROSCOPE (AFM); CONTINUOUS FUNCTIONS; CONVERSION FACTORS; FORCE APPLICATION; FORCE SENSING; FORCE SENSORS; INTERACTION FORCES; LASER MEASURING; LATERAL POSITION; NANO MANIPULATION; NON-LINEAR CALIBRATION; NONLINEAR CURVE FIT; NONLINEARITY (INCLUDING BIFURCATION THEORY); OPTICAL (PET) (OPET); OPTICAL-LEVER; PIEZORESISTIVE MICROCANTILEVER; POSITION SENSITIVE DETECTOR (PSD); SENSITIVITY FUNCTIONS; SPRING CONSTANTS; VOLTAGE RESPONSE;

IMAGING TECHNIQUES;

EID: 47849107497     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2008.920722     Document Type: Article

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