Robust approach to maximize the range and accuracy of force application in atomic force microscopes with nonlinear position-sensitive detectors

Nanotechnology

Volumn 17, Issue 21, 2006, Pages 5525-5530

  Silva, E C C M ^a   Van Vliet, K J ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA PROCESSING; DEFLECTION (STRUCTURES); ERROR ANALYSIS; FORCE MEASUREMENT; NANOSTRUCTURED MATERIALS; NONLINEAR SYSTEMS; ROBUSTNESS (CONTROL SYSTEMS);

FORCE APPLICATION; FORCE DISPLACEMENT RESPONSE; OPTICAL FEEDBACK; POSITION SENSITIVE DETECTORS;

ATOMIC FORCE MICROSCOPY;

EID: 33846065196     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/21/038     Document Type: Article

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