Atomic force microscopy nanomanipulation of silicon nanocrystals for nanodevice fabrication

Nanotechnology

Volumn 14, Issue 12, 2003, Pages 1272-1278

  Decossas, Sébastien ^a   Mazen, Frédéric ^a   Baron, Thierry ^b   Brémond, Georges ^a   Souifi, Abdelkader ^a  

^a UNIVERSITÉ DE LYON   (France)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON RESONANCE; ELECTRON TUNNELING; NANOSTRUCTURED MATERIALS; RESONANT TUNNELING; SEMICONDUCTOR DEVICE MANUFACTURE; THERMOOXIDATION; TUNNEL JUNCTIONS;

NANODEVICE FABRICATION; SILICON NANOCRYSTAL;

SILICON WAFERS;

EID: 0347654973     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/12/008     Document Type: Article

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