The effect of substrate temperature on the properties of ITO thin films for OLED applications

Semiconductor Science and Technology

Volumn 21, Issue 12, 2006, Pages 1747-1752

  Reddy, V Sivaji ^a   Das, K ^a   Dhar, A ^a   Ray, S K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; GLASS; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; OPACITY; OPTICAL PROPERTIES; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION; THERMAL EFFECTS;

INDIUM TIN OXIDE (ITO); SURFACE SMOOTHNESS;

THIN FILMS;

EID: 33846875864     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/21/12/043     Document Type: Article

References (30)

1. Tang C W and Vanslyke S A 1987 Appl. Phys. Lett. 51 913
2. Li G, Chu C W, Shrotriya V, Huang J and Yang Y 2006 Appl. Phys. Lett. 88 253503
3. Suzuki Y, Niino F and Katoh K 1997 J. Non-Cryst. Solids 218 30
4. Whang K-W and Kim J K 2005 J. Display Tech. 1 295
5. Buchanan M, Webb J B and Williams D F 1980 Appl. Phys. Lett. 37 213
6. Wang R X, Beling C D, Fung S, Djurisic A B, Ling C C and Li S 2005 J. Appl. Phys. 97 033504
7. Kane J, Schweizer H P and Kern W 1975 Thin Solid Films 29 155
8. Su C, Sheu T K, Chang Y T, Wan M A, Feng M C and Hung W C 2005 Synth. Met. 153 9
9. Kobayashi H, Ishida T, Nakato Y and Tsubomura H 1991 J. Appl. Phys. 69 1736
10. Kim H, Pique A, Horwitz J S, Mattoussi H, Murata H, Kafafi Z H and Chrisey D B 1999 Appl. Phys. Lett. 74 3444
11. Chen B J, Sun X W and Sarma K R 2006 Appl. Phys. Lett. 88 243505
12. Kim H, Horwitz J S, Kim W H, Kafafi Z H and Chrisey D B 2002 J. Appl. Phys. 91 5371
13. Nisha M, Anusha S, A Antony, Manoj R and Jayaraj M K 2005 Appl. Surf. Sci. 252 1430
14. Gupta S and Ada E 2005 J. Vac. Sci. Technol. A 23 1173
15. Meng L-J and dos Santos M P 1997 Thin Solid Films 303 151
16. Rogozin A I, Vinnichenko M V, Kolitsch A and Moller W 2004 J. Vac. Sci. Technol. A 22 349
17. Vasant kumar C V R and A Mansingh 1989 J. Appl. Phys. 65 1270
18. Meng L-J and dos Santos M P 2000 J. Vac. Sci. Technol. A 18 1668
19. Joint Committee on Powder Diffraction Standards Powder Diffraction File card no. 06-0416
20. Kim D, Han Y, Cho J-S and Koh S-K 2000 Thin Solid Films 377-8 81
21. Jung Y S and Lee S S 2003 J. Cryst. Growth 259 343
22. Mergel D and Qiao Z 2004 J. Appl. Phys 95 5608
23. Hamberg I, Granqvist C G, Berggren K F, Sernelius B E and Engstrom L 1984 Phys. Rev. B 30 3240
24. Haacke G 1976 J. Appl. Phys. 47 4086
25. Schroder D K 1998 Semiconductor Material and Device Characterization (New York: Wiley) p 168
26. Parker I D 1994 J. Appl. Phys. 75 1656
27. Zhu M, Cui T and Varahramyan K 2004 Microelectron. Eng. 75 269
28. Santos L F, Bianchi R F and Faria R M 2004 J. Non-Cryst. Solids 338-340 590
29. Harada K, Werner A G, Pfeiffer M, Bloom C J, Elliott C M and Leo K 2005 Phys. Rev. Lett. 94 036601
30. Hsiao C-C, Chang C-H, Jen T-H, Hung M-C and Chen S-A 2006 Appl. Phys. Lett. 88 033512