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Volumn 155, Issue 8, 2008, Pages

Low-temperature low-resistivity PEALD TiN using TDMAT under hydrogen reducing ambient

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; AMINATION; AMINES; ATOMIC LAYER DEPOSITION; CHEMICAL PROPERTIES; CHEMICAL REACTIONS; CHEMISORPTION; HYDROGEN; HYDROGEN BONDS; ORGANIC COMPOUNDS; ORGANOMETALLICS; PHYSICAL PROPERTIES; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION; SURFACE CHEMISTRY; SURFACE REACTIONS; THICK FILMS; TIN; TITANIUM; TITANIUM CARBIDE; TITANIUM COMPOUNDS; VAPOR DEPOSITION;

EID: 46649115354     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2940306     Document Type: Article
Times cited : (42)

References (25)
  • 3
  • 4
    • 0024131192 scopus 로고
    • 0040-6090 10.1016/0040-6090(88)90375-6.
    • L. Hiltunen, Thin Solid Films 0040-6090 10.1016/0040-6090(88)90375-6, 166, 149 (1988).
    • (1988) Thin Solid Films , vol.166 , pp. 149
    • Hiltunen, L.1
  • 12
    • 46649095344 scopus 로고    scopus 로고
    • Air Products, Schumacher technical document.
    • TDEAT/TDMAT Promobook, Air Products, Schumacher technical document (2003).
    • (2003) TDEAT/TDMAT Promobook
  • 18
    • 0037029614 scopus 로고    scopus 로고
    • 0953-8984 10.1088/0953-8984/14/17/315.
    • R. Eibler, J. Phys.: Condens. Matter 0953-8984 10.1088/0953-8984/14/17/ 315, 14, 4425 (2002).
    • (2002) J. Phys.: Condens. Matter , vol.14 , pp. 4425
    • Eibler, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.