Remote plasma enhanced metalorganic chemical vapor deposition of TiN from tetrakis-dimethyl-amido-titanium

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2822-2826

  Yun, Ju Young ^a   Rhee, Shi Woo ^a   Park, Sanggee ^b   Lee, Jae Gab ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Kookmin University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM COMPOUNDS;

REMOTE PLASMA ENHANCED METALORGANIC CHEMICAL VAPOR DEPOSITION; TETRAKIS DIMETHYL AMIDO TITANIUM;

TITANIUM NITRIDE;

EID: 0034315763     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1316103     Document Type: Article

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