Temporally resolved Schwarzschild microscope for the characterization of extreme ultraviolet emission in laser-produced plasmas

Review of Scientific Instruments

Volumn 75, Issue 12, 2004, Pages 5173-5176

  Tao, Y ^a   Nakai, M ^a   Nishimura, H ^a   Fujioka, S ^a   Okuno, T ^a   Fujiwara, T ^a   Ueda, N ^a   Miyanaga, N ^a   Izawa, Y ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LASER PULSES; LIGHT EMISSION; MIRRORS; MULTILAYERS; OPTICAL MICROSCOPY; PHOTONS; PLASMAS;

EXTREME ULTRAVIOLET (EUV) IMAGER; EXTREME ULTRAVIOLET EMISSION; PEAK REFLECTIVITY;

ULTRAVIOLET RADIATION;

EID: 20444487363     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1818891     Document Type: Article

References (8)

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