Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography

Applied Physics Letters

Volumn 92, Issue 15, 2008, Pages

  White, J ^a   O'Sullivan, G ^a   Zakharov, S ^b,e   Choi, P ^b   Zakharov, V ^c   Nishimura, H ^d   Fujioka, S ^d   Nishihara, K ^d  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

^b EPPRA   (France)

^c KELDYSH INSTITUTE OF APPLIED MATHEMATICS   (Russian Federation)

^d OSAKA UNIVERSITY   (Japan)

^e KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY; LASER PULSES; LITHOGRAPHY; MAGNETOHYDRODYNAMICS; TIN;

SEMICONDUCTOR MANUFACTURING; ULTRAVIOLET LITHOGRAPHY;

LASER PRODUCED PLASMAS;

EID: 42249116169     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2906901     Document Type: Article

References (19)

1. D. Attwood, J. Phys. D 37 (2004).
2. M. C. Richardson, C.-S. Koay, K. Takenoshita, C. Keyser, B. Bernath, S. A. George, and S. Teerawattanasook, Proc. SPIE 5580, 434 (2005).
3. A. Cummings, G. O'Sullivan, P. Dunne, E. Sokell, N. Murphy, and J. White, J. Phys. D 38, 604 (2005).
4. H. Tanaka, A. Matsumoto, K. Akinaga, A. Takahashi, and T. Okada, Appl. Phys. Lett. 87, 041503 (2006).
5. Y. Tao and M. S. Tillack, EUV Source Workshop, Vancouver, May 2006 (unpublished).
6. P. Hayden, A. Cummings, N. Murphy, G. O'Sullivan, P. Sheridan, J. White, and P. Dunne, J. Appl. Phys. 99, 093302 (2006).
7. T. Higashiguchi, N. Dojyo, M. Hamada, W. Sasaki, and S. Kubodera, Appl. Phys. Lett. 88, 201503 (2006).
8. Y. Tao, H. Nishimura, S. Fujioka, A. Sunahara, M. Nakai, T. Okuno, N. Ueda, K. Nishihara, N. Miyanaga, and Y. Izawa, Appl. Phys. Lett. 86, 201501 (2005).
9. G. O'Sullivan, A. Cummings, G. Duffy, P. Dunne, A. Fitzpatrick, P. Hayden, L. McKinney, N. Murphy, D. O'Reilly, E. Sokell, and J. White, Proc. SPIE 5196, 273 (2004).
10. G. O'Sullivan, A. Cummings, P. Dunne, P. Hayden, L. McKinney, N. Murphy, and J. White, EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Washington, 2006).
11. A. Cummings, G. O'Sullivan, P. Dunne, E. Sokell, N. Murphy, and J. White, J. Phys. D 38, 604 (2005).
12. J. White, P. Hayden, P. Dunne, A. Cummings, N. Murphy, P. Sheridan, and G. O'Sullivan, J. Appl. Phys. 98, 113301 (2005).
13. S. Zakharov, V. G. Novikov, and P. Choi, EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Washington, 2006).
14. B. F. Rozsnayi, Phys. Rev. E 55, 7507 (1997).
15. K. Nishihara and V. Bakshi, EUV Source Workshop, Barcelona, October 2006 (unpublished).
16. T. Ando, S. Fujioka, H. Nishimura, N. Ueda, Y. Yasuda, K. Nagai, T. Norimatsu, M. Murakami, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. 89, 151501 (2006).
17. S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa, and K. Mima, Phys. Rev. Lett. 95, 235004 (2005).
18. M. Lysaght, D. Kilbane, N. Murphy, A. Cummings, P. Dunne, and G. O'Sullivan, Phys. Rev. A 72, 014502 (2005).
19. J. White, P. Dunne, P. Hayden, F. O'Reilly, and G. O'Sullivan, Appl. Phys. Lett. 90, 181502 (2007).