-
1
-
-
84901886296
-
-
Sentaurus Process User Guide, version Y-2006.06 (2006)
-
Sentaurus Process User Guide, version Y-2006.06 (2006)
-
-
-
-
3
-
-
11744280642
-
-
A. Parisini, D. Nobili, A. Armigliato, M. Derdour, L. Moro, S. Solmi: Appl. Phys. A Vol. 54 (1992), p. 221
-
(1992)
Appl. Phys. A
, vol.54
, pp. 221
-
-
Parisini, A.1
Nobili, D.2
Armigliato, A.3
Derdour, M.4
Moro, L.5
Solmi, S.6
-
5
-
-
0000657992
-
-
D. Nobili, S. Solmi, A. Parisini, M. Derdour, A. Armigliato, L. Moro: Phys. Rev. B Vol. 49 (1994), p. 2477.
-
(1994)
Phys. Rev. B
, vol.49
, pp. 2477
-
-
Nobili, D.1
Solmi, S.2
Parisini, A.3
Derdour, M.4
Armigliato, A.5
Moro, L.6
-
6
-
-
33847664572
-
-
K. Suzuki, Y. Kataoka, S. Nagayama, C.W. Magee, T.H. Büyü klimanli, T. Nagayama: IEEE Trans. Electron Devices Vol. 54 (2007), p. 262
-
(2007)
IEEE Trans. Electron Devices
, vol.54
, pp. 262
-
-
Suzuki, K.1
Kataoka, Y.2
Nagayama, S.3
Magee, C.W.4
Büyü klimanli, T.H.5
Nagayama, T.6
-
9
-
-
33746211444
-
-
F.F. Komarov , O.I. Velichko , V.A. Dobrushkin, A.M. Mironov: Phys.Rev. B Vol. 74 (2006), p. 035205
-
(2006)
Phys.Rev. B
, vol.74
, pp. 035205
-
-
Komarov, F.F.1
Velichko, O.I.2
Dobrushkin, V.A.3
Mironov, A.M.4
-
10
-
-
0033321675
-
-
D. Nobili, S. Solmi, M. Merli, J. Shaoc: J. Electrochem. Soc. Vol. 146 (1999), p. 4246
-
(1999)
J. Electrochem. Soc
, vol.146
, pp. 4246
-
-
Nobili, D.1
Solmi, S.2
Merli, M.3
Shaoc, J.4
-
12
-
-
0000670225
-
-
R. Kasnavi, Y. Sun, R. Mo, P. Pianetta, P.B. Griffin, J.D. Plummer: J. Appl. Phys. Vol. 87 (2000), p. 2255
-
(2000)
J. Appl. Phys
, vol.87
, pp. 2255
-
-
Kasnavi, R.1
Sun, Y.2
Mo, R.3
Pianetta, P.4
Griffin, P.B.5
Plummer, J.D.6
-
13
-
-
33745241362
-
-
M. Ferri, S. Solmi, A. Parisini M. Bersani, D. Giubertoni, M. Barozzi: J. Appl. Phys. Vol. 99 (2006), p. 113508
-
(2006)
J. Appl. Phys
, vol.99
, pp. 113508
-
-
Ferri, M.1
Solmi, S.2
Parisini, A.3
Bersani, M.4
Giubertoni, D.5
Barozzi, M.6
-
14
-
-
45749152511
-
-
C. Steen, P. Pichler, H. Ryssel, L. Pei, G. Duscher, M. Werner, J. van der Berg, W. Windl: Mater. Res. Symp. Soc. Proc. 994 (2007), p. 0994-F08-02
-
C. Steen, P. Pichler, H. Ryssel, L. Pei, G. Duscher, M. Werner, J. van der Berg, W. Windl: Mater. Res. Symp. Soc. Proc. Vol. 994 (2007), p. 0994-F08-02
-
-
-
-
15
-
-
0024883448
-
-
F. Lau, L. Mader, C. Mazure, Ch. Werner, M. Orlowski: Appl. Phys. A Vol. 49 (1989), p. 671
-
(1989)
Appl. Phys. A
, vol.49
, pp. 671
-
-
Lau, F.1
Mader, L.2
Mazure, C.3
Werner, C.4
Orlowski, M.5
-
16
-
-
39549103652
-
-
edited by D. Schmitt-Landsiedel and R. Thewes, IEEE
-
C. Steen, A. Martinez-Limia, P. Pichler, H. Ryssel, L. Pei, G. Duscher, W. Windl: in ESSDERC 2007, edited by D. Schmitt-Landsiedel and R. Thewes, IEEE (2007), p. 267
-
(2007)
ESSDERC 2007
, pp. 267
-
-
Steen, C.1
Martinez-Limia, A.2
Pichler, P.3
Ryssel, H.4
Pei, L.5
Duscher, G.6
Windl, W.7
-
17
-
-
0024751469
-
-
A. Nylandsted Larsen, P.E. Andersen, P. Gaiduk, K. Kyllesbech Larsen: Materials Science and Engineering B Vol. 4 (1989), p. 107
-
(1989)
Materials Science and Engineering B
, vol.4
, pp. 107
-
-
Nylandsted Larsen, A.1
Andersen, P.E.2
Gaiduk, P.3
Kyllesbech Larsen, K.4
-
18
-
-
0012321110
-
-
A. Nylandsted Larsen, K. Kyllesbech Larsen, P.E. Andersen, B.G. Svensson: J. Appl. Phys. Vol. 73 (1993), p. 691
-
(1993)
J. Appl. Phys
, vol.73
, pp. 691
-
-
Nylandsted Larsen, A.1
Kyllesbech Larsen, K.2
Andersen, P.E.3
Svensson, B.G.4
-
19
-
-
0018429798
-
-
J. Murota, E. Arai, K. Kobayashi, K. Kudo: J. Appl. Phys. Vol. 50 (1979), p. 804
-
(1979)
J. Appl. Phys
, vol.50
, pp. 804
-
-
Murota, J.1
Arai, E.2
Kobayashi, K.3
Kudo, K.4
-
21
-
-
0002734525
-
Concentration profiles of diffused dopants in silicon
-
edited by F.F.Y. Wang, North-Holland Publishing Company
-
R.B.Fair: "Concentration profiles of diffused dopants in silicon", in: Impurity Doping Processes In Silicon, edited by F.F.Y. Wang, (North-Holland Publishing Company 1981)
-
(1981)
Impurity Doping Processes In Silicon
-
-
Fair, R.B.1
-
25
-
-
0242335691
-
-
S. Solmi, M. Ferri, M. Bersani, D. Giubertoni, V. Soncini: J. Appl. Phys,. Vol. 94 (2003), p. 4950
-
(2003)
J. Appl. Phys
, vol.94
, pp. 4950
-
-
Solmi, S.1
Ferri, M.2
Bersani, M.3
Giubertoni, D.4
Soncini, V.5
-
26
-
-
24144440781
-
-
B.J. Pawlak, R. Duffy, T. Janssens, W. Vandervorst, K. Maex, A.J. Smith, N.E.B. Cowern, T. Dao, Y. Tamminga: Appl. Phys. Lett. Vol. 87 (2005), p. 031915
-
(2005)
Appl. Phys. Lett
, vol.87
, pp. 031915
-
-
Pawlak, B.J.1
Duffy, R.2
Janssens, T.3
Vandervorst, W.4
Maex, K.5
Smith, A.J.6
Cowern, N.E.B.7
Dao, T.8
Tamminga, Y.9
-
27
-
-
27744442207
-
-
C. Tsamis, D. Skarlatos, G. BenAssayag, A. Claverie, W. Lerch, V. Valamontes: Appl. Phys. Lett. Vol. 87 (2005), p. 201903
-
(2005)
Appl. Phys. Lett
, vol.87
, pp. 201903
-
-
Tsamis, C.1
Skarlatos, D.2
BenAssayag, G.3
Claverie, A.4
Lerch, W.5
Valamontes, V.6
-
28
-
-
0004515091
-
-
V. Krishnamoorthy, K. Moller, K.S. Jones, D. Venables, J. Jackson, and L. Rubin: J. Appl. Phys. Vol. 84 (1998), p. 5997
-
(1998)
J. Appl. Phys
, vol.84
, pp. 5997
-
-
Krishnamoorthy, V.1
Moller, K.2
Jones, K.S.3
Venables, D.4
Jackson, J.5
Rubin, L.6
-
29
-
-
11044221139
-
-
M. Dalponte, H. Boudinov, L.V. Goncharova, D. Starodub, E. Garfunkel, and T. Gustafsson: J. Appl. Phys. Vol. 96 (2004), p. 7388
-
(2004)
J. Appl. Phys
, vol.96
, pp. 7388
-
-
Dalponte, M.1
Boudinov, H.2
Goncharova, L.V.3
Starodub, D.4
Garfunkel, E.5
Gustafsson, T.6
-
30
-
-
47649130014
-
-
W. Lerch, S. Paul, J. Chan, S. McCoy, J. Gelpey, F. Cristiano, F. Severac, P.F. Fazzini, D. Bolze, P. Pichler, A. Martinez, A. Mineji, S. Shishiguchi: Extended Abstract of the Seventh International Workshop on Junction Technology (IWJT2007), Kyoto, Japan, ISBN 1-4244-1103-3, (2007), p. 129
-
W. Lerch, S. Paul, J. Chan, S. McCoy, J. Gelpey, F. Cristiano, F. Severac, P.F. Fazzini, D. Bolze, P. Pichler, A. Martinez, A. Mineji, S. Shishiguchi: Extended Abstract of the Seventh International Workshop on Junction Technology (IWJT2007), Kyoto, Japan, ISBN 1-4244-1103-3, (2007), p. 129
-
-
-
-
31
-
-
47949124137
-
-
Catania, Italy, ISBN 1-4244-1227-7
-
th IEEE Intl. Conf. on Advanced Thermal Processing of Semiconductors-RTP 2007, Catania, Italy, ISBN 1-4244-1227-7, (2007), p. 191
-
(2007)
th IEEE Intl. Conf. on Advanced Thermal Processing of Semiconductors-RTP
, pp. 191
-
-
Lerch, W.1
Paul, S.2
Niess, J.3
McCoy, S.4
Gelpey, J.5
Bolze, D.6
Cristiano, F.7
Severac, F.8
Fazzini, P.F.9
Martinez, A.10
Pichler, P.11
|