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Volumn 573-574, Issue , 2008, Pages 279-293

Modeling and simulation of advanced annealing processes

Author keywords

Arsenic clustering; Arsenic deactivation; Arsenic diffusion; Arsenic precipitation; Arsenic segregation; Flash annealing; Silicon; Spike annealing

Indexed keywords

ARSENIC; BUDGET CONTROL; RAPID THERMAL PROCESSING; SILICON;

EID: 45749104080     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.573-574.279     Document Type: Article
Times cited : (6)

References (31)
  • 1
    • 84901886296 scopus 로고    scopus 로고
    • Sentaurus Process User Guide, version Y-2006.06 (2006)
    • Sentaurus Process User Guide, version Y-2006.06 (2006)
  • 14
    • 45749152511 scopus 로고    scopus 로고
    • C. Steen, P. Pichler, H. Ryssel, L. Pei, G. Duscher, M. Werner, J. van der Berg, W. Windl: Mater. Res. Symp. Soc. Proc. 994 (2007), p. 0994-F08-02
    • C. Steen, P. Pichler, H. Ryssel, L. Pei, G. Duscher, M. Werner, J. van der Berg, W. Windl: Mater. Res. Symp. Soc. Proc. Vol. 994 (2007), p. 0994-F08-02
  • 21
    • 0002734525 scopus 로고
    • Concentration profiles of diffused dopants in silicon
    • edited by F.F.Y. Wang, North-Holland Publishing Company
    • R.B.Fair: "Concentration profiles of diffused dopants in silicon", in: Impurity Doping Processes In Silicon, edited by F.F.Y. Wang, (North-Holland Publishing Company 1981)
    • (1981) Impurity Doping Processes In Silicon
    • Fair, R.B.1
  • 30
    • 47649130014 scopus 로고    scopus 로고
    • W. Lerch, S. Paul, J. Chan, S. McCoy, J. Gelpey, F. Cristiano, F. Severac, P.F. Fazzini, D. Bolze, P. Pichler, A. Martinez, A. Mineji, S. Shishiguchi: Extended Abstract of the Seventh International Workshop on Junction Technology (IWJT2007), Kyoto, Japan, ISBN 1-4244-1103-3, (2007), p. 129
    • W. Lerch, S. Paul, J. Chan, S. McCoy, J. Gelpey, F. Cristiano, F. Severac, P.F. Fazzini, D. Bolze, P. Pichler, A. Martinez, A. Mineji, S. Shishiguchi: Extended Abstract of the Seventh International Workshop on Junction Technology (IWJT2007), Kyoto, Japan, ISBN 1-4244-1103-3, (2007), p. 129


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.