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Journal of Applied Physics

Volumn 90, Issue 1, 2001, Pages 101-107

Clustering equilibrium and deactivation kinetics in arsenic doped silicon

(3) Nobili, D a,b Solmi, S a Shao, J a,c

a CNR (Italy)

b UNIVERSITY OF BOLOGNA (Italy)

c SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035396027 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1377607 Document Type: Article

Times cited : (22)

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