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Volumn 87, Issue 20, 2005, Pages 1-3

Interstitial injection in silicon after high-dose, low-energy arsenic implantation and annealing

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARSENIC; BORON; DIFFUSION; ETCHING; LOW TEMPERATURE EFFECTS;

INTERSTITIAL INJECTION; LOW-ENERGY ARSENIC IMPLANTATION;

SILICON;

EID: 27744442207 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2130397 Document Type: Article

Times cited : (8)

References (12)

1
- 0024629164
- Y. Kim, H. Z. Massoud, and R. B. Fair, J. Electron. Mater. 18, 143 (1989).
- (1989) J. Electron. Mater. , vol.18 , pp. 143
- Kim, Y.¹ Massoud, H.Z.² Fair, R.B.³

2
- 24844437057
- V. Krishnamoorthy, B. Beaudet, K. S. Jones, and D. Venables, Tech. Dig. - Int. Electron Devices Meet. 1997, 638.
- Tech. Dig. - Int. Electron Devices Meet. , vol.1997 , pp. 638
- Krishnamoorthy, V.¹ Beaudet, B.² Jones, K.S.³ Venables, D.⁴

3
- 0004515091
- V. Krishnamoorthy, K. Moller, K. S. Jones, D. Venables, J. Jackson, and L. Rubin, J. Appl. Phys. 84, 5997 (1998).
- (1998) J. Appl. Phys. , vol.84 , pp. 5997
- Krishnamoorthy, V.¹ Moller, K.² Jones, K.S.³ Venables, D.⁴ Jackson, J.⁵ Rubin, L.⁶

4
- 0033341929
- K. S. Jones, D. Downey, H. Miller, J. Chow, J. Chen, M. Puga-Lambers, K. Moller, M. Wright, E. Heitman, J. Glasberg, M. Law, L. Robertson, and R. Brindos, Tech. Dig. - Int. Electron Devices Meet. 1999, 841.
- Tech. Dig. - Int. Electron Devices Meet. , vol.1999 , pp. 841
- Jones, K.S.¹ Downey, D.² Miller, H.³ Chow, J.⁴ Chen, J.⁵ Puga-Lambers, M.⁶ Moller, K.⁷ Wright, M.⁸ Heitman, E.⁹ Glasberg, J.¹⁰ Law, M.¹¹ Robertson, L.¹² Brindos, R.¹³

5
- 10644286967
- R. Kim, T. Aoki, Y. Furuta, H. Kobyashi, J. Xia, T. Saito, Y. Kamakura, and K. Taniguchi, Mater. Res. Soc. Symp. Proc. 610, B8.2.1 (2000).
- (2000) Mater. Res. Soc. Symp. Proc. , vol.610 , pp. 821
- Kim, R.¹ Aoki, T.² Furuta, Y.³ Kobyashi, H.⁴ Xia, J.⁵ Saito, T.⁶ Kamakura, Y.⁷ Taniguchi, K.⁸

6
- 0003412161
- Pergamon, New York
- J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Matter (Pergamon, New York, 1985).
- (1985) The Stopping and Range of Ions in Matter
- Ziegler, J.F.¹ Biersack, J.P.² Littmark, U.³

7
- 85069407937
- E-MRS Spring Meeting, May 31-June 3, Strasbourg, France.
- C. Tsamis, D. Skarlatos, V. Valamontes, D. Tsoukalas, G. BenAssayag, A. Claverie, and W. Lerch, E-MRS Spring Meeting, May 31-June 3, Strasbourg, France.
- Tsamis, C.¹ Skarlatos, D.² Valamontes, V.³ Tsoukalas, D.⁴ Benassayag, G.⁵ Claverie, A.⁶ Lerch, W.⁷

8
- 0037744553
- A. Claverie, B. Colombeau, B. de Mauduit, C. Bonafos, X. Hebras, G. Ben Assayag, and F. Cristiano, Appl. Phys. A: Mater. Sci. Process. A76, 1025 (2003).
- (2003) Appl. Phys. A: Mater. Sci. Process. , vol.76 , pp. 1025
- Claverie, A.¹ Colombeau, B.² De Mauduit, B.³ Bonafos, C.⁴ Hebras, X.⁵ Ben Assayag, G.⁶ Cristiano, F.⁷

9
- 85069409530
- E-MRS Spring Meeting, Strasburg
- D. Girginoudi, N. Georgoulas, A. Thanailakis, and E. K. Polychroniadis, E-MRS Spring Meeting, Strasburg, 2004.
- (2004)
- Girginoudi, D.¹ Georgoulas, N.² Thanailakis, A.³ Polychroniadis, E.K.⁴

10
- 27744457873
- S. Whelan, V. Privitera, G. Mannino, M. Italia, C. Bongiorno, A. La Magna, and E. Napolitani, J. Appl. Phys. 90, 5997 (1998).
- (1998) J. Appl. Phys. , vol.90 , pp. 5997
- Whelan, S.¹ Privitera, V.² Mannino, G.³ Italia, M.⁴ Bongiorno, C.⁵ La Magna, A.⁶ Napolitani, E.⁷

11
- 0001016899
- P. M. Rousseau, P. B. Griffin, W. T. Fang, and J. D. Plummer, J. Appl. Phys. 84, 3593 (1998).
- (1998) J. Appl. Phys. , vol.84 , pp. 3593
- Rousseau, P.M.¹ Griffin, P.B.² Fang, W.T.³ Plummer, J.D.⁴

12
- 0242335691
- S. Solmi, M. Ferri, M. Bersani, D. Giubertoni, and V. Soncini, J. Appl. Phys. 94, 4950 (2003).
- (2003) J. Appl. Phys. , vol.94 , pp. 4950
- Solmi, S.¹ Ferri, M.² Bersani, M.³ Giubertoni, D.⁴ Soncini, V.⁵

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