Integration of pixelated phase masks for full-chip random logic layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Schenker, Richard ^a   Bollepalli, Srinivas ^a   Hu, Bin ^a   Toh, Kenny ^a   Singh, Vivek ^a   Yung, Karmen ^a   Cheng, Wen Hao ^a   Borodovsky, Yan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

AltnPSM; Computational lithography; High transmission; ILT; Phase shift mask; Pixel; Pixelated; PPM; PSM; SRAF; Thick mask

Indexed keywords

65NM GENERATION; ATTENUATED PHASE SHIFT MASKS; INTERCONNECT LAYERS; MASK MAKING; METAL LAYERS; OPTICAL MICRO LITHOGRAPHY; PHASE CONFIGURATIONS; PHASE MASKS; PIXEL SIZES;

FUZZY LOGIC; GLASS; IMAGING TECHNIQUES; MASKS;

PIXELS;

EID: 45449085432     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771677     Document Type: Conference Paper

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