ILT for double exposure lithography with conventional and novel materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Poonawala, Amyn ^a   Borodovsky, Yan ^b   Milanfar, Peyman ^a  

^a University of California Santa Cruz   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

CEL; Double exposure lithography; ILS; Inverse lithography; Two photon absorption resist

Indexed keywords

ABSORPTION; ALGORITHMS; COMPUTER SIMULATION; MATHEMATICAL MODELS; PATTERN RECOGNITION; PHOTONS;

AERIAL IMAGES; DOUBLE EXPOSURE LITHOGRAPHY; INVERSE LITHOGRAPHY; TWO-PHOTON ABSORPTION RESIST;

PHOTOLITHOGRAPHY;

EID: 35148824088     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712382     Document Type: Conference Paper

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