Optical extensions towards the 45 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 357-368

  Hendrickx, E ^a   Monnoyer, P ^a   Van Look, L ^a   Vandenberghe, G ^a  

^a IMEC   (Belgium)

Author keywords

ArF Lithography; Forbidden pitch; Mask error factor; Optical extensions; Process window

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; ERROR ANALYSIS; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT; PRINTING; SCANNING;

ARF LITHOGRAPHY; FORBIDDEN PITCH; MASK ERROR FACTORS (MEF); OPTICAL EXTENSIONS; PROCESS WINDOW;

OPTICAL SYSTEMS;

EID: 3843120854     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537522     Document Type: Conference Paper

References (9)

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