Making a trillion pixels dance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Singh, Vivek ^a   Hu, Bin ^a   Toh, Kenny ^a   Bollepalli, Srinivas ^a   Wagner, Stephan ^a   Borodovsky, Yan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Computational lithography; Moore's law; Pixelated mask technology; Thick mask models

Indexed keywords

(ABIOTIC AND BIOTIC) STRESS; (OTDR) TECHNOLOGY; 65-NM NODES; 65NM TECHNOLOGY; COLLAPSE (DRYING); COMPUTATIONAL SCHEMES; COMPUTATIONAL TECHNIQUES; DEGREES OF FREEDOM; DOMAIN BOUNDARIES; DOMAIN DECOMPOSITION (D-D); FEATURE SIZES; FINAL PRODUCTS; GLOBAL MINIMUM (GM); HIGH VOLUME MANUFACTURE (HVM); KEY COMPONENTS; LAYER METHOD; LENGTH SCALING; MANUFACTURABILITY; MASK MANUFACTURING; MASK TECHNOLOGY; METAL LAYERS; NON-TRIVIAL; OBJECTIVE FUNCTION (OF); OPTICAL MICRO LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION (OPC); OPTIMIZATION ALGORITHMS; SCALING-UP; SOFTWARE SYSTEMS; TRADITIONAL METHODS; TWO-COLOR;

AEROSPACE APPLICATIONS; ALGORITHMS; BOUNDARY LAYER FLOW; COLOR; COMPUTER NETWORKS; COMPUTER SOFTWARE; COMPUTER SOFTWARE SELECTION AND EVALUATION; DOMAIN DECOMPOSITION METHODS; ELECTROACUPUNCTURE; ELECTRON BEAM LITHOGRAPHY; EVOLUTIONARY ALGORITHMS; FUNCTION EVALUATION; GALLIUM ALLOYS; GLASS; HUMAN COMPUTER INTERACTION; IMAGE QUALITY; IMAGING TECHNIQUES; INDUSTRIAL ENGINEERING; INTEGER PROGRAMMING; MATHEMATICAL MODELS; MICROFLUIDICS; NANOTECHNOLOGY; NUMERICAL METHODS; OPTICAL PROPERTIES; PIXELS; SET THEORY; TECHNOLOGY; VERIFICATION;

COMPUTATIONAL METHODS;

EID: 45449115366     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773248     Document Type: Conference Paper

References (8)

1. Jaione Tirapu-Azpiroz, Paul Burchard, and Eli Yablonovitch, "Boundary layer model to account for thick mask effects in photolithography," Proc. SPIE 5040, 1611 (2003)
2. Konstantinos Adam and Andrew R. Neureuther, "Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering," J. Microlithogr. Microfabrication, Microsyst. 1, 253 (2002)
3. Peng Liu and Vivek Singh, "Quick and accurate modeling of transmitted field", United States Patent 7,294,437.
4. Yuri Granik, "Solving Inverse Problems of Optical Microlithography," Optical Microlithography XVIII, SPIE Vol 5754, 2005.
5. Amyn Poonawala, Peyman Milanfar, "Mask Design for Optical Microlithography - An Inverse Imaging Problem," IEEE Trans on Image Processing, Vol. 16, No. 3, 2007.
6. Paul Davids, and Srinivas Bollepalli, "Generalized inverse problem for partially coherent projection lithography," Proc. SPIE, Vol. 6924-32, 2008.
7. Yan A. Borodovsky, Wen-Hao Cheng, Paul Davids, Richard E. Schenker, Vivek Singh, "Pixelated phase mask as novel lithography RET", Proc. SPIE, Vol. 6924-13, 2008.
8. Richard E. Schenker, Srinivas B. Bollepalli, Bin Hu, Kenny Toh, Vivek Singh, Karmen Yung, Wen-Hao Cheng, Yan A. Borodovsky, "Integration of phase pixel masks for full-chip random logic layers", Proc. SPIE, Vol. 6924-17, 2008.