Generalized inverse lithography methods for phase-shifting mask design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Ma, D Xu ^a   Arce, Gonzalo R ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Image synthesis; Optical lithography; Phase shifting mask; Wavelet penalty

Indexed keywords

INVERSE PROBLEMS; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; WAVELET ANALYSIS;

IMAGE SYNTHESIS; OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFTING MASKS; WAVELET PENALTY;

MASKS;

EID: 35048891024     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711559     Document Type: Conference Paper

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