Fabrication of defect-free full-field pixelated phase mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Cheng, Wen Hao ^a   Farnsworth, Jeff ^a   Kwok, Wai ^a   Jamieson, Andrew ^a   Wilcox, Nathan ^a   Vernon, Matt ^a   Yung, Karmen ^a   Liu, Yi Ping ^a   Kim, Jun ^a   Frendberg, Eric ^a   Chegwidden, Scott ^a   Schenker, Richard ^a   Borodovsky, Yan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT FREE; DEFECT INSPECTION; FULL-FIELD; LATERAL SIZES; MASK TECHNOLOGY; OPTICAL MICRO LITHOGRAPHY; PATTERN MASK; PHASE MASKS;

EID: 45449113559     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772955     Document Type: Conference Paper

References (2)

1. U.S. Patent pending: ID 20070002322 "Image inspection method."
2. U.S. Patent pending: "A method of repairing a photolithographic mask."