Electron energy-loss spectroscopy characterization of ∼1 nm-thick amorphous film at grain boundary in Si-based ceramics

Materials Transactions

Volumn 45, Issue 7, 2004, Pages 2091-2098

  Gu, Hui ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

Electron energy loss spectroscopy (EELS); Grain boundary; Inter granular amorphous film; Silicon carbide; Silicon nitride

Indexed keywords

CERAMIC MATERIALS; CHEMICAL BONDS; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; GRAIN BOUNDARIES; MICROSTRUCTURE; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE;

CHEMICAL STATES; INTER-GRANULAR FILMS; INTERFACIAL PHASES; SPECTRAL PROCESSING;

AMORPHOUS FILMS;

EID: 4544381173     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.45.2091     Document Type: Conference Paper

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