Structure and chemistry of interfaces in Si3N4 ceramics studied by transmission electron microscopy

Journal of the Ceramic Society of Japan

Volumn 105, Issue 6, 1997, Pages 453-475

  Kleebe, Hans Joachim ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

Electron energy loss spectroscopy; Grain boundary film thickness; Grain boundary structure; Silicon nitride; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; CERAMIC MATERIALS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; DIFFUSION IN SOLIDS; DOPING (ADDITIVES); GRAIN BOUNDARIES; IMAGING TECHNIQUES; PHASE INTERFACES; STATISTICAL METHODS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ACOUSTIC EMISSION MICROSCOPY (AEM); DIFFUSE DARK FIELD IMAGING; FRESNEL FRINGE IMAGING; HIGH RESOLUTION ELECTRON MICROSCOPY (HREM); HIGH RESOLUTION LATTICE IMAGING;

SILICON NITRIDE;

EID: 0031167608     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.105.453     Document Type: Article

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