A reusable high aspect ratio parylene-C shadow mask technology for diverse micropatterning applications

Sensors and Actuators, A: Physical

Volumn 145-146, Issue 1-2, 2008, Pages 306-315

  Selvarasah, S ^a   Chao, S H ^a   Chen, C L ^a   Sridhar, S ^b   Busnaina, A ^a   Khademhosseini, A ^c,d   Dokmeci, M R ^a  

^a Northeastern University   (United States)

^b NORTHEASTERN UNIVERSITY   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d BRIGHAM AND WOMEN S HOSPITAL   (United States)

Author keywords

Flexible shadow masks; High aspect ratio polymer etching; Parylene C

Indexed keywords

BIOMOLECULES; CELLS; COMPUTER NETWORKS; DIMENSIONAL STABILITY; FLUID MECHANICS; MICROCHANNELS; MICROFLUIDICS; PHOTORESISTS; PRESSURE DROP; PROTEINS; SURFACES; TECHNOLOGY;

(2+1) DIMENSIONS; (OTDR) TECHNOLOGY; ALIGNMENT ACCURACY; ELSEVIER (CO); ETCH PROCESSING; FEATURE SIZES; FINE RESOLUTION; HIGH ASPECT RATIO (HAR); LOW COSTS; LOW TEMPERATURE (LTR); METHACRYLATE (APMA); MICRO-PATTERNING; ORGANIC TRANSISTORS; PARYLENE; PARYLENE C; PATTERNING PROTEINS; PDMS SURFACES; POTENTIAL APPLICATIONS; SHADOW MASK TECHNOLOGY; SHADOW MASKING; WAFER-SCALE;

ASPECT RATIO;

EID: 44849097498     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2007.10.053     Document Type: Article

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