All-photoplastic microstencil with self-alignment for multiple layer shadow-mask patterning

Sensors and Actuators, A: Physical

Volumn 107, Issue 2, 2003, Pages 132-136

  Kim, Gyuman ^a   Kim, Beomjoon ^b   Brugger, Jürgen ^a,c  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c EPFL   (Switzerland)

Author keywords

Membrane; Multi layer evaporation; Photoplastic; Shadow mask

Indexed keywords

DEPOSITION; ETCHING; MASKS; MICROELECTRONIC PROCESSING; MICROMACHINING; PHOTOLITHOGRAPHY; SILICON WAFERS;

MICROSTENCIL; MULTILAYER SURFACE PATTERNING; PHOTOPLASTIC; SHADOW MASK PATTERNING; SILICON MICROMACHINING;

MICROSENSORS;

EID: 0142123330     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00298-X     Document Type: Article

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