On the mechanism of low-pressure imprint lithography: Capillarity vs viscous flow

Langmuir

Volumn 24, Issue 10, 2008, Pages 5459-5463

  Khang, Dahl Young ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARITY; FLUID DYNAMICS; FLUID MECHANICS; MOLDS; NANOIMPRINT LITHOGRAPHY; PRESSURE; VISCOSITY; VISCOUS FLOW;

AMERICAN CHEMICAL SOCIETY (ACS); APPLIED PRESSURE; DOMINANT MECHANISM; HARD MOLDS; HIGH TEMPERATURE (HT); IMPRINT LITHOGRAPHY (IL); INITIAL STAGES; LOW PRESSURE (LP); MATERIAL CHARACTERISTICS;

MECHANISMS;

NANOTUBE; POLYMER;

ARTICLE; ATMOSPHERIC PRESSURE; BIOPHYSICS; CHEMISTRY; EQUIPMENT DESIGN; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PRESSURE; SURFACE PROPERTY; TEMPERATURE; VISCOSITY;

ATMOSPHERIC PRESSURE; BIOPHYSICS; CAPILLARITY; EQUIPMENT DESIGN; MATERIALS TESTING; NANOTECHNOLOGY; NANOTUBES; PARTICLE SIZE; POLYMERS; PRESSURE; SURFACE PROPERTIES; TEMPERATURE; VISCOSITY;

EID: 44649185045     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la703084p     Document Type: Article

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