Compact laser plasma EUV source based on a gas puff target for metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 389-396

  Fiedorowicz, Henryk ^a   Bartnik, Andrzej ^a   Jarocki, Roman ^a   Kostecki, Jerzy ^a   Mikolajczyk, Janusz ^a   Rakowski, Rafal ^a   Szczurek, Miroslaw ^a  

^a MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Gas puff target; Laser plasma EUV sources; Laser plasmas; Lithography

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; LASER PULSES; LITHOGRAPHY; OPTIMIZATION; PARTICLE BEAM INJECTION; PLASMA SOURCES; TARGETS; ULTRAVIOLET RADIATION;

ELECTROMAGNETIC VALVES; GAS PUFF TARGET; LASER ENERGY; LASER PLASMA EXTREME ULTRAVIOLET SOURCES;

LASER PRODUCED PLASMAS;

EID: 0141836102     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482749     Document Type: Conference Paper

References (5)

1. D. T.Attwood, Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, 1999)
2. H. Fiedorowicz, A. Bartnik, H. Daido, I. W. Choi, M. Suzuki, S. Yamagami, "Strong EUV emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser" Optics Communications 184, 161 (2000)
3. R. De Bruijn, A. Bartnik, H. Fledderus, H. Fiedorowicz, P. Hageman, R. Constantinescu, F. Bijkerk, in Proc. of SPIE Vol. 3997, Emerging Lithographic Technologies IV, Ed. E. A. Dobisz, (SPIE Press, Bellingham, 2000)
4. S. Kranzusch and K. Mann, "Spectral characterization of EUV radiation emitted from a laser-irradiated gas puff target" Optics Communications 200, 223 (2001)
5. H. Fiedorowicz, A. Bartnik, R. Jarocki, J. Kostecki, R. Rakowski, M. Szczurek, "Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies" in Proc. SPIE Vol. 4688, Emerging Lithography Technologies VI, Ed. R. L. Engelstad (SPIE Press, Bellingham, 2002)