Status of the liquid-xenon-jet laser-plasma source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 102-109

  Hansson, Björn A M ^a,b   Rymell, Lars ^a   Berglund, Magnus ^a   Hemberg, Oscar ^a   Janin, Emmanuelle ^a   Thoresen, Jalmar ^a   Mosesson, Sofia ^a   Wallin, Johan ^a   Hertz, Hans M ^b  

^a Innolite AB   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

EUV lithography; Laser produced plasma; Liquid jet; Xenon

Indexed keywords

IONIZATION; LITHOGRAPHY; SPUTTERING; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LASER PRODUCED PLASMAS;

EID: 0036378687     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472274     Document Type: Article

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