Portable diagnostics for EUV light sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue 1, 2000, Pages 121-127

  Stuik, R ^a   Constantinescu, R ^b   Hegeman, P ^b   Jonkers, J ^b   Fledderus, H F ^a   Banine, V ^c   Bijkerk, F ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c ASM   (Netherlands)

Author keywords

EUV; EUV diagnostics; Lithography; Source

Indexed keywords

CONTAMINATION; LIGHT SOURCES; PLASMA DIAGNOSTICS; PLASMA STABILITY; SIZE DETERMINATION;

EXTREME-ULTRAVIOLET (EUV) LIGHT SOURCES; EXTREME-ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0034498427     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.406663     Document Type: Article

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