Nanocrystalline silicon TFT process using silane diluted in argon-hydrogen mixtures

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2513-2518

  Kandoussi, K ^a   Simon, C ^a   Coulon, N ^a   Belarbi, K ^a   Mohammed Brahim, T ^a  

^a UNIVERSITÉ DE RENNES 1   (France)

Author keywords

73.63.Bd; 81.15.Gh; 85.35. p; Atomic force and scanning tunneling microscopy; Chemical vapor deposition; Conductivity; Crystal growth; Crystallization; Devices; Diffraction and scattering measurements; Electrical and electronic properties; Films and coatings; Microcrystallinity; Microstructure; Nanocrystals; Nanoparticles; Optical spectroscopy; Plasma deposition; Raman scattering; Thin film transistors

Indexed keywords

CRYSTAL GROWTH; CRYSTALLIZATION; ELECTRONIC PROPERTIES; GAS MIXTURES; METASTABLE PHASES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILANES; THIN FILM TRANSISTORS;

ARGON HYDROGEN MIXTURES; DEPOSITION RATE; FILMS DEPOSITION;

NANOCRYSTALLINE SILICON;

EID: 42649092104     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.074     Document Type: Article

References (14)

1. Wagner S., Gleskova H., Cheng I., and Wu M. Thin Solid Films 430 (2003) 15
2. Matsuda A. Thin Solid Films 337 (1999) 1
3. Hamma S., and Roca i Cabarrocas P. J. Non-Cryst. Solids 227-230 (1998) 852
4. Kushner M.J. J. Appl. Phys. 63 (1988) 2532
5. Sansonnens L., Howling A.A., Hollenstein Ch., Dorier J.L., and Kroll U. J. Phys. D: Appl. Phys. 27 (1994) 1406
6. Ray P.P., Gupta N.D., Chaudhuri P., Williamson D.L., Vignoli S., and Longeaud C. J. Non-Cryst. Solids 299-302 (2002) 123
7. Jana M., and Das D. Sol. Energy Mater. Sol. Cells 79 (2003) 519
8. Wang H.H., Lin J., and Huan C.H.A. Mater. Sci. Eng. B 104 (2003) 80
9. Das U.K., and Chaudhuri P. Chem. Phys. Lett. 298 (1998) 211
10. Kandoussi K., Simon C., Coulon N., Mohammed-Brahim T., and Moreac A. J. Non-Cryst. Solids 352 (2006) 968
11. Iqbal Z., Webb A.P., and Veprek S. Appl. Phys. Lett. 36 (1980) 163
12. Kandoussi K., Gaillard A., Simon C., Coulon N., Pier T., and Mohammed-Brahim T. J. Non-Cryst. Solids 352 (2006) 1728
13. Fontcuberta i Morral A., Bertomeu J., and Roca i Cabarrocas P. Mater. Sci. Eng. B 69&70 (2000) 559
14. Werner J.H., Dassow R., Rinke T.J., Köhler J.R., and Bergmann R.B. Thin Solid Films 383 (2001) 95