Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition

Materials Science and Engineering: B

Volumn 104, Issue 1-2, 2003, Pages 80-87

  Wang, Y H ^a,b   Lin, J ^a   Huan, C H A ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Heterogeneity; Hydrogenated amorphous silicon; Microstructure; PE CVD

Indexed keywords

ARGON; ENERGY GAP; HYDROGENATION; INFRARED SPECTROSCOPY; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

FILM DEPOSITION;

AMORPHOUS SILICON;

EID: 0141955997     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(03)00309-X     Document Type: Article

References (20)

1. R.A. Street, Hydrogenated Amorphous Silicon, Cambridge University Press, Cambridge, 1991.
2. Yang J., Guha S. Appl. Phys. Lett. 61:1992;2917.
3. Guha S., Yang J., Bannerjee A., Glatfelter T., Hoffman K., Ovshinsky S.R., Izu M., Ovshinsky H.C., Deng X. Mater. Res. Soc. Symp. Proc. 336:1994;645.
4. Das U.K., Chaudhuri P., Kshirsagar S.T. J. Appl. Phys. 80:1996;5389.
5. Yamaguchi M., Moigaki K. Phil. Mag. B. 79:1999;387.
6. Chaudhuri P., Das U.K. Jpn. J. Appl. Phys. 34:1995;3467.
7. J. Tauc, Amorphous and Liquid Semiconductor, Plenum Press, London, 1974.
8. N.F. Mott, E.A. Davis, Electronic Processes in Non-Crystalline Solids, second ed., Clarendon, Oxford, 1979.
9. Kim D.S., Lee Y.H. Thin Solid Films. 283:1996;109.
10. Lifshitz Y., Lempert G.D., Grossman E. Phys. Rev. Lett. 72:1994;2753.
11. Langford A.A., Fleet M.L., Nelson B.P., Lanford W.A., Maley N. Phys. Rev. B. 45:1992;13367.
12. Shanks H.R., Fang C.J., Ley L., Cardona M., Demond F.J., Kalbitzer S. Phys. Status Solidi B. 100:1980;43.
13. Landford W.A., Rand M.J. J. Appl. Phys. 49:1978;2474.
14. Freeman E.C., Paul W. Phys. Rev. B. 18:1978;4288.
15. Fang C.J., Ley L., Shanks H.R., Gruntz K.J., Cardona M. Phys. Rev. B. 22:1980;6140.
16. Mui K., Basa D.K., Smith F.W. Phys. Rev. B. 25:1987;8089.
17. Basa D.K., Smith F.W. Thin Solid Films. 192:1990;121.
18. Johnson N.M., Ready S.E., Boyce J.B., Doland C.D., Wolff S.H., Walker J. Appl. Phys. Lett. 53:1989;1626.
19. Voutsaa A.T., Hatilis M.K., Boyce J. J. Appl. Phys. 78(12):1995;6999.
20. Iqbal Z., Vepreck S. J. Phys. C. 15:1982;377.