Microcrystallisation in Si:H: The effect of gas pressure in Ar-diluted SiH4 plasma

Solar Energy Materials and Solar Cells

Volumn 79, Issue 4, 2003, Pages 519-526

  Jana, Madhusudan ^a,b   Das, Debajyoti ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

^b Tamralipta Mahavidyalaya   (India)

Author keywords

Microcrystalline silicon; Raman spectroscopy; RF glow discharge; Transmission electron microscopy

Indexed keywords

CRYSTALLIZATION; DEPOSITION; HYDROGEN; PLASMAS; RAMAN SPECTROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

GAS PRESSURE;

SOLAR ENERGY;

EID: 0042011375     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(03)00102-8     Document Type: Article

References (7)

1. Ch. Hollenstein, U. Kroll, A.A. Howling, J. Dutta, J.-L. Dorrier, J. Meier, R. Tscharner, A. Shah, Proceedings of the 11th European PVSEC, Montreux, 1992, p. 132.
2. Kim S.C., Park K.C., Kim S.K., Kim T.G., Pyun J.S., Jun J.M., Jang J. Mater. Res. Soc. Symp. Proc. 258:1992;51.
3. Das D., Jana M., Barua A.K. J. Appl. Phys. 89:2001;3041.
4. Jana M., Das D., Barua A.K. J. Appl. Phys. 91:2002;5442.
5. Kawasaki H., Ohkura H., Fukuzawa T., Shiratani M., Watanabe Y., Yamamoto Y., Suganuma S., Hori M., Goto T. Jpn. J. Appl. Phys. 36:1997;4985.
6. Kushner M. J. Appl. Phys. 63:1988;2532.
7. M. Kondo, T. Nishimoto, M. Takai, S. Suzuki, Y. Nasuno, A. Matsuda, Technical Digest of the 12th International PVSEC, Jeju, Korea, 2001, p. 41.