|
Volumn 91, Issue 2, 2008, Pages 267-271
|
Formation of coherent Ge shallow dome islands on Si(001) by ultra-high-vacuum ion beam sputter deposition
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
LATTICE MISMATCH;
SILICON;
SPUTTER DEPOSITION;
TRANSMISSION ELECTRON MICROSCOPY;
ULTRAHIGH VACUUM;
STRAIN MEASUREMENTS;
TRENCH FORMATION;
ION BEAMS;
|
EID: 40949110482
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-007-4384-z Document Type: Article |
Times cited : (12)
|
References (21)
|