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Volumn 92, Issue 10, 2008, Pages

Impact of germanium related defects on electrical performance of hafnium oxide

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY FUNCTIONAL THEORY; GERMANIUM COMPOUNDS; HAFNIUM COMPOUNDS; MOSFET DEVICES; OXYGEN VACANCIES;

EID: 40849136419     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2883944     Document Type: Article
Times cited : (30)

References (15)
  • 4
    • 40849139326 scopus 로고    scopus 로고
    • International Technology Roadmafor Semiconductors, Semiconductor Industry Association, see Table 66 for new gate stack processes and materials.
    • International Technology Roadmap for Semiconductors, Semiconductor Industry Association, 2005, see Table 66 for new gate stack processes and materials.
    • (2005)
  • 13
    • 0001671054 scopus 로고
    • PRBMDO 0163-1829 10.1103/PhysRevB.51.4014.
    • G. Makov and M. C. Payne, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.51.4014 51, 4014 (1995).
    • (1995) Phys. Rev. B , vol.51 , pp. 4014
    • Makov, G.1    Payne, M.C.2
  • 14


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.