-
3
-
-
0036923998
-
-
TDIMD5 0163-1918.
-
C. O. Chui, H. Kim, D. Chi, B. B. Triplett, P. C. McIntyre, and K. C. Saraswat, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 2002, 437.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2002
, pp. 437
-
-
Chui, C.O.1
Kim, H.2
Chi, D.3
Triplett, B.B.4
McIntyre, P.C.5
Saraswat, K.C.6
-
4
-
-
40849139326
-
-
International Technology Roadmafor Semiconductors, Semiconductor Industry Association, see Table 66 for new gate stack processes and materials.
-
International Technology Roadmap for Semiconductors, Semiconductor Industry Association, 2005, see Table 66 for new gate stack processes and materials.
-
(2005)
-
-
-
5
-
-
32044449370
-
-
JESOAN 0013-4651 10.1149/1.2160432.
-
Q. C. Zhang, N. Wu, D. M. Y. Lai, Y. Nikolai, L. K. Bera, and C. X. Zhu, J. Electrochem. Soc. JESOAN 0013-4651 10.1149/1.2160432 153, G207 (2006).
-
(2006)
J. Electrochem. Soc.
, vol.153
, pp. 207
-
-
Zhang, Q.C.1
Wu, N.2
Lai, D.M.Y.3
Nikolai, Y.4
Bera, L.K.5
Zhu, C.X.6
-
7
-
-
33645508747
-
-
APPLAB 0003-6951 10.1063/1.2001757.
-
N. Lu, W. Bai, A. Ramirez, C. Mouli, A. Ritenour, M. L. Lee, D. Antoniadis, and D. L. Kwong, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2001757 87, 051922 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 051922
-
-
Lu, N.1
Bai, W.2
Ramirez, A.3
Mouli, C.4
Ritenour, A.5
Lee, M.L.6
Antoniadis, D.7
Kwong, D.L.8
-
8
-
-
34249905188
-
-
JESOAN 0013-4651 10.1149/1.2734875.
-
C. C. Cheng, C. H. Chien, G. L. Luo, C. H. Yang, M. L. Kuo, J. H. Lin, C. K. Tseng, and C. Y. Chang, J. Electrochem. Soc. JESOAN 0013-4651 10.1149/1.2734875 154, G155 (2007).
-
(2007)
J. Electrochem. Soc.
, vol.154
, pp. 155
-
-
Cheng, C.C.1
Chien, C.H.2
Luo, G.L.3
Yang, C.H.4
Kuo, M.L.5
Lin, J.H.6
Tseng, C.K.7
Chang, C.Y.8
-
9
-
-
2942581439
-
-
APPLAB 0003-6951 10.1063/1.1737057.
-
N. Wu, Q. C. Zhang, C. X. Zhu, C. C. Yeo, S. J. Whang, D. S. H. Chan, M. F. Li, B. J. Cho, A. Chin, D. L. Kwong, A. Y. Du, C. H. Tung, and N. Balasubramanian, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1737057 84, 3741 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 3741
-
-
Wu, N.1
Zhang, Q.C.2
Zhu, C.X.3
Yeo, C.C.4
Whang, S.J.5
Chan, D.S.H.6
Li, M.F.7
Cho, B.J.8
Chin, A.9
Kwong, D.L.10
Du, A.Y.11
Tung, C.H.12
Balasubramanian, N.13
-
10
-
-
9744276741
-
-
APPLAB 0003-6951 10.1063/1.1810642.
-
S. Van Elshocht, B. Brijs, M. Caymax, T. Conard, T. Chiarella, S. De Gendt, B. De Jaeger, S. Kubicek, M. Meuris, B. Onsia, O. Richard, I. Teerlinck, J. Van Steenbergen, C. Zhao, and M. Heyns, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1810642 85, 3824 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 3824
-
-
Van Elshocht, S.1
Brijs, B.2
Caymax, M.3
Conard, T.4
Chiarella, T.5
De Gendt, S.6
De Jaeger, B.7
Kubicek, S.8
Meuris, M.9
Onsia, B.10
Richard, O.11
Teerlinck, I.12
Van Steenbergen, J.13
Zhao, C.14
Heyns, M.15
-
11
-
-
34547213272
-
-
APPLAB 0003-6951 10.1063/1.2756108.
-
Q. Q. Sun, W. Chen, S. J. Ding, M. Xu, D. W. Zhang, and L. K. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2756108 91, 022901 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 022901
-
-
Sun, Q.Q.1
Chen, W.2
Ding, S.J.3
Xu, M.4
Zhang, D.W.5
Wang, L.K.6
-
13
-
-
0001671054
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.51.4014.
-
G. Makov and M. C. Payne, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.51.4014 51, 4014 (1995).
-
(1995)
Phys. Rev. B
, vol.51
, pp. 4014
-
-
Makov, G.1
Payne, M.C.2
-
15
-
-
0347252670
-
-
V. Milman, B. Winkler, J. A. White, C. J. Pickard, M. C. Payne, E. V. Akhmatskaya, and R. H. Nobes, Int. J. Quantum Chem. 77, 895 (2000).
-
(2000)
Int. J. Quantum Chem.
, vol.77
, pp. 895
-
-
Milman, V.1
Winkler, B.2
White, J.A.3
Pickard, C.J.4
Payne, M.C.5
Akhmatskaya, E.V.6
Nobes, R.H.7
|