Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study

Applied Physics Letters

Volumn 91, Issue 2, 2007, Pages

  Sun, Qing Qing ^a   Chen, Wei ^a   Ding, Shi Jin ^a   Xu, Min ^a   Zhang, David Wei ^a   Wang, Li Kang ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CHLORINE; DENSITY FUNCTIONAL THEORY; ENERGY GAP; VALENCE BANDS;

CHLORINE RESIDUE; ELECTRON CHEMICAL POTENTIAL; INTERSTITIAL SITE;

HAFNIUM COMPOUNDS;

EID: 34547213272     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2756108     Document Type: Article

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