Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 1, 2008, Pages

  Patrick, Heather J ^a   Attota, Ravikiran ^b   Barnes, Bryan M ^a   Germer, Thomas A ^a   Dixson, Ronald G ^a   Stocker, Michael T ^a   Silver, Richard M ^a   Bishop, Michael R ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b KT Consulting Inc   (United States)

^c SEMATECH   (United States)

Author keywords

Back focal plane; Conscopic imaging; Microscopy; Optical critical dimension; Scatterometry; Semiconductors

Indexed keywords

ANGULAR DISTRIBUTION; LIGHTING; SCATTERING; SEMICONDUCTOR MATERIALS; SENSITIVITY ANALYSIS; SILICON;

INCIDENT ILLUMINATION; OPTICAL CRITICAL DIMENSION;

DIFFRACTION GRATINGS;

EID: 40749137817     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2885275     Document Type: Article

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