Resist and etched line profile characterization using scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3050, Issue , 1997, Pages 476-486

  Raymond, Christopher J ^a   Naqvi, S Sohail H ^a   McNeil, John R ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

Diffraction; Metrology; Optical metrology; Process control; Scatterometry

Indexed keywords

DIFFRACTION; LINEWIDTH; MEASUREMENT ERRORS; MEASUREMENTS;

AVERAGE DIFFERENCES; CD MEASUREMENTS; FILM LAYERS; LINE PROFILES; LINE-WIDTHS; MEASUREMENT TECHNIQUES; METROLOGY; OPTICAL METROLOGY; PARAMETERIZED; PROCESS MEASUREMENTS; SCATTEROMETRY; SEM; SEM IMAGES; SIDE WALL ANGLES;

PROCESS CONTROL;

EID: 0000051473     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275944     Document Type: Conference Paper

References (11)

1. C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, "Multi-parameter CD Metrology Measurements Using Scatterometry," Integrated Circuit Metrology, Inspection and Process Control X, Proc. SPIE 2725, 1996.
2. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, J. R. McNeil, "Metrology of subwavelength photoresist gratings using optical scatterometry", Journal of Vacuum Science and Technology B 13(4), pp. 1484-1495, 1995.
3. C. J. Raymond, et al., "Multi-parameter grating metrology using optical scatterometry", Journal of Vacuum Science and Technology B (accepted for publication), 1997.
4. C. J. Raymond, J. R. McNeil, S. S. H. Naqvi, "Scatterometry for CD Measurements of Etched Structures," Integrated Circuit Metrology, Inspection and Process Control X, Proc. SPIE 2725, 1996.
5. S. S. H. Naqvi, J. R. McNeil, R. H. Krukar, K. P. Bishop, "Scatterometry and the simulation of diffraction-based metrology", Microlithography World 2(3), 1993.
6. S. T. Peng, T. Tamir, H. L. Bertoni, "Theory of Periodic Dielectric Waveguides", IEEE Transactions on Microwave Theory and Techniques MTT-23(1), pp. 123-133, 1975.
7. M. G. Moharam, T. K. Gaylord, "Diffraction analysis of dielectric surface-relief gratings", Journal of the Optical Society of America 72, pp. 1385-1392, 1982.
8. M. G. Moharam, T. K. Gaylord, G. T. Sincerbox, H. Werlich, B. Yung, "Diffraction characteristics of photoresist surface-relief gratings", Applied Optics 23(18), pp. 3214-3220, 1984.
9. K. P. Bishop, S. M. Gaspar, L. M. Milner, S. S. H. Naqvi, J. R. McNeil, "Grating line shape characterization using scatterometry," International Conference on the Application and Theory of Periodic Structures, Proc. SPIE 1545, pp. 64-73, 1991.
10. M. R. Murnane, C. J. Raymond, Z. R. Hatab, S. S. H. Naqvi, J. R. McNeil, "Developed photoresist metrology using scatterometry," Integrated Circuit Metrology, Inspection and Process Control VIII, Proc. SPIE 2196, pp. 47-59, 1994.
11. C. J. Raymond, M. R. Murnane, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, "Multi-parameter process metrology using scatterometry," Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II, Proc. SPIE 2638, pp. 84-93, 1995.