Line-profile and critical-dimension monitoring using a normal incidence optical CD metrology

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 4, 2004, Pages 564-572

  Yang, Weidong ^a   Hu, Jiangtao ^a   Lowe Webb, Roger ^a   Korlahalli, Rahul ^a   Shivaprasad, Deepak ^a   Sasano, Hiroki ^b   Liu, Wei ^b   Mui, David S L ^b  

^a NANOMETRICS INC   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

Critical dimension (CD); Diffraction; Optical critical dimension (OCD); Optical metrology; Process control

Indexed keywords

COMPUTATIONAL METHODS; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTROMAGNETIC WAVE SCATTERING; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION (CD); ONE DIMENSIONAL (1D) DIFFRACTION GRATINGS; OPTICAL CRITICAL DIMENSION (OCD); OPTICAL METROLOGY;

LITHOGRAPHY;

EID: 9144243805     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.835728     Document Type: Article

References (9)

1. W. A. McGahan, J. M. Holden, P. I. Rovira, R. Lowe-Webb, R. A. Yarussi, V. Zhuang, and V. J. Coates, "Design and performance of a normal-incidence optical critical dimension metrology system," in Proc. Microprocesses and Nanotechnotogy Conf., Shimane, Japan, Oct. 2001. presented.
2. N. Blayo, R. A. Cirelli, F. P. Klemens, and J. T. C. Lee, "Ultraviolet-visible ellipsometry for process control during the etching of submicrometer features," J. Opt. Soc. Amer. A, vol. 12, p. 591, 1995.
3. X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, "Specular spectroscopic scatterometry," IEEE Trans. Semiconduct. Manufact., vol. 14, pp. 97-111, May 2001.
4. S. S. H. Naqvi et al., "Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles," J. Opt. Soc. Amer. A, vol. 11, p. 2485, 1994.
5. C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, "Metrology of subwavelength photoresist gratings using optical scatterometry," J. Vac. Sci. Technol. B, vol. 13, no. 4, p. 1484, 1995.
6. M. G. Moharam and T. K. Gaylord, "Diffraction analysis of dielectric surface-relief gratings," J. Opt. Soc. Amer., vol. 72, pp. 1385-1392, Oct. 1982.
7. M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: Enhanced transmittance matrix approach," J. Opt. Soc. Amer. A, vol. 12, no. 5, pp. 1077-1086, May 1995.
8. H.-T. Huang, W. Kong, and F. L. Terry, "Normal incidence spectroscopic ellipsometry for critical dimension monitoring," Appl. Phys. Lett., vol. 78, no. 25. p. 3983, June 2001.
9. D. Mui, H. Sasano, W. Liu, J. Kretz, J. Yamartino, M. Barnes, and K. Fairbairn, "Critical dimension and profile measurement by optical scatterometry for sub-0.15 μm advanced gate and shallow trench isolation structures," in Proc. AVS 48th Symp., San Francisco. CA, 2001. presented.