Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3741-3746

  Zhang, Zhen ^a   Jiang, Zhiquan ^a   Yao, Yunxi ^a   Tan, Dali ^a   Fu, Qiang ^a   Bao, Xinhe ^a  

^a DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

High resolution electron energy loss spectroscopy; Metal oxide interfaces; Scanning tunneling microscopy; Silica films; Ultraviolet photoelectron spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; THIN FILMS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

METAL-OXIDE INTERFACES; SILICA FILMS;

SILICA;

EID: 40749089476     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.070     Document Type: Article

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