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Surface Review and Letters

Volumn 7, Issue 1-2, 2000, Pages 7-14

Epitaxial growth of SiO2 on Mo(112)

(6) Schroeder, T a Adelt, M a Richter, B a Naschitzki, M a Baumer, M a Freund, H J a

a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM; SILICON DIOXIDE;

ARTICLE; CATALYSIS; CRYSTAL STRUCTURE; FILM; OXIDATION; STOICHIOMETRY; SYNTHESIS; THERMAL CONDUCTIVITY;

EID: 0033809240 PISSN: 0218625X EISSN: None Source Type: Journal
DOI: 10.1016/S0218-625X(00)00003-8 Document Type: Article

Times cited : (141)

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