Structure of thin SiO2 films grown on Mo(112)

Physical Review B - Condensed Matter and Materials Physics

Volumn 69, Issue 15, 2004, Pages

  Chen, M S ^a   Santra, A K ^a   Goodman, D W ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM; OXYGEN; SILICON DIOXIDE;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BOND; CHEMICAL STRUCTURE; ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM; OXIDATION; PHONON; REPRODUCIBILITY; STOICHIOMETRY; SURFACE PROPERTY; TEMPERATURE; THICKNESS;

EID: 37649030529     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.155404     Document Type: Article

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