Morphological and electronic properties of ultrathin crystalline silica epilayers on a Mo(112) substrate

Physical Review B - Condensed Matter and Materials Physics

Volumn 66, Issue 16, 2002, Pages 1654221-16542211

  Schroeder, T ^a   Giorgi, Javier B ^a,b   Baumer M ^a   Freund, H J ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b UNIVERSITY OF OTTAWA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM; SILICON DIOXIDE;

ABSORPTION SPECTROSCOPY; ARTICLE; AUGER ELECTRON SPECTROSCOPY; CATALYST; CRYSTAL; CRYSTALLIZATION; ELECTRON DIFFRACTION; ELECTRONICS; GROWTH; MATHEMATICAL MODEL; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; STOICHIOMETRY; SURFACE PROPERTY; TECHNIQUE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037110185     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.66.165422     Document Type: Article

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