Growth of single-crystal SiO2 film on Ni(111) surface

Applied Physics Letters

Volumn 80, Issue 11, 2002, Pages 1921-1923

  Kundu, Manisha ^a   Murata, Yoshitada ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT OXYGEN; ATOMIC HYDROGEN; CRYSTALLOGRAPHIC ORIENTATIONS; HIGH TEMPERATURE PHASE; POLYCRYSTALLINE; SILICIDE PHASE;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; HYDROGEN; QUARTZ; SILICIDES;

FILM GROWTH;

EID: 79955987791     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1461052     Document Type: Article

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